A unique cluster tool designed and developed indigenously has all the capabilities of growing nano films and fabricating devices. It has has been implemented to fabricate
The HWCVD cluster tool is a multichambered tool used to deposit silicon based thin films and devices. Four chambers are HWCVD reactors, one a load lock and one chamber is meant to deposit RF sputtered transparent conducting oxide (TCO) thin films.
Customized instrument from Provak and Advanced Process Technology, PuneTwo single chambered HWCVD systems are housed in the lab for the deposition of silicon based alloys like silicon nitride and silicon carbon and for graphene. HWCVD silicon nitride deposited in the chamber is used as dielectric and an insulating layer. The silicon carbon films are used as dielectric barriers and etch stop layers in VLSI.
This system is used for metal deposition for electrodes/contacts on devices by thermal evaporation.
The RF magnetron sputtering system is integrated with the HWCVD cluster tool which is is used to deposit transparent conducting oxides like AZO and ITO on solar cells.
The Dektak 150 is a stylus profiler that is used to measure height differences on two-dimensional surfaces. In this system, the stylus is held statically in place and makes physical contact with the sample surface by movement of the stage front to back to measure changes in surface height.
VeecoDektak 150 Surface ProfilerQSSPC technique is very effective for determining minority charge carrier’s lifetime (τeff) of photovoltaic-grade monocrystalline and multicrystalline Silicon. It also provides with Suns-Voc tool which measures the photovoltageVOCSunsas a function of illumination.
Sinton Consulting Inc., WCT-120It is a very sensitive and precise technique to determine the defect density in the amorphous and microcrystalline silicon thin films. This instrument also performs external quantum efficiency and current-voltage measurements of the solar cells.
Customized instrument from Sciencetech Inc. CanadaOne of the most advanced and versatile wire bonders available in the institute; which can be used for bonding of Gold, Aluminum and Copper wires on the solar cells, electronic chips, sensing arrays and other semiconductor devices to make fine and precise contacts on small area.
West Bond Model 747677E-79Software and temperature controller set-up provided by Dynamic Controls, Mumbai
Resistance vs Temperature, or Current vs Temperature, or Current vs Voltage measurement.
JASCO V-530
UV/Vis/NIR spectroscopy is used to study the optical properties of thin films like reflectance, transmittance, etc.
Assembled in-house
Measurement of resistivity of thin film and bulk semiconductors
Nikon Optiphot 66
Rame-Hart Contact Angle Goniometer 230
Indigenously developed by PROVAK, Pune
PECVD is a deposition tool to deposit thin films using plasma technology. Compared to other deposition technologies such as PVD and Thermal CVD which are widely used for semiconductor device fabrication, PECVD can deposit thin films such as SiOx, SiNx, a-Si, BxC and DLC with high uniformity over the wafers at relatively low temperature. Currently, this system is used for BxC deposition.
Indigenously developed by PROVAK, Pune
RIE system offers etching solutions of a wide variety of material including Silicon, SiO2, SiNx compound semiconductors, metals and organics such as polymers and photoresists. The systems can control etch profile (isotropic or anisotropic) in high etch uniformity over the substrates. The system can be also used for surface treatment.
Indigenously developed by PROVAK, Pune
ICP CVD can be used to deposit a wide range of materials, including silicon oxide, silicon dioxide, silicon nitride, diamond like carbon, and amorphous silicon.
EST 1200 Carbolite Gero
Annealing solid samples
Ecopia HMS-3000 Hall Measurement System
It is a complete system for measuring the resistivity, carrier concentration, P/N type, and mobility of various materials including semiconductors (N Type & P Type) such as Si, Ge, SiGe, SiC, GaAs, InGaAs, InP, GaN, ZnO, TCOs, metals, ox-ides, etc., at both 300K and 77K. The user must supply the PC, however, all other materials needed to begin making measurements are included.
The HMS-3000 includes software with I-V curve capability to check the ohmic contact of the sample contacts.
Photo Emission Tech. Inc. (Model no. CT150AAA-EM)
Assembled In-house
Gauge factor measurement