The Semiconductor Thin Film and Plasma Processing Lab was set up in 1995 to carry out fundamental and applied research in the area of semiconductor thin films and devices, surface modification and plasma processing of various materials. Our main aim was to develop new processes and materials in thin film form, capable for a variety of applications ranging from solar cells, thin film light emitting devices (TFLEDs), microelectronic devices, sensors and actuators (MEMS). In the last twenty years we have expanded our scope of research from silicon based thin films to silicon nanostructures, boron carbide and also graphene.
The work carried out till now has long reaching implications in technology and has established the applicability of the HWCVD process in the area of photovoltaics, nanotechnology, MEMS and back end processing in microelectronics industry. Major research contributions are
Greetings and Welcome to our lab webpage!
The Semiconductor Thin Films and Plasma Processing Laboratory @ Department of Metallurgical Engineering and Materials Science, IIT Bombay is one of the pioneering labs in IIT Bombay to initiate work on thin film semiconductor materials and devices. Over the years our thrust has been to develop Silicon based thin films and other nanostructures by the novel Hot Wire Chemical vapor Deposition technique for realising applications in energy generation (Photovoltaics), storage (batteries and supercapacitors), health monitoring, nuclear detection, etc, thus contributing to needs of the country and society in general.
You are welcome to visit our webpage and learn more about our work. We also welcome you to communicate with us in case you find anything of your interest and would like to explore common work themes with us.
Department of Physics, The Ohio State University
Department of Physics, Technical University of Munich
Center for Photonics and Quantum Materials, Skolkovo Institute of Science and Technology
Sahibabad, UP, India